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SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Optical Microlithography XX - A solid-state 193-nm laser with high spatial coherence for sub-40-nm interferometric immersion lithography
Merriam, Andrew J., Flagello, Donis G., Bethune, Donald S., Hoffnagle, John A., Hinsberg, William D., Jefferson, C. Michael, Jacob, James J., Litvin, TimothyVolume:
6520
Year:
2007
Language:
english
DOI:
10.1117/12.712210
File:
PDF, 801 KB
english, 2007