SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2008)] Advances in Resist Materials and Processing Technology XXV - Study of shallow trench isolation dry etching process using oxide hard mask and KrF photo-resist in 90 nm stand-alone flash device
Henderson, Clifford L., Cho, Eunsang, Lee, Mingon, Shin, Dongwon, Hwang, Sangil, Ryu, Sangwook, Lee, KanghyunVolume:
6923
Year:
2008
Language:
english
DOI:
10.1117/12.773264
File:
PDF, 574 KB
english, 2008