SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 22 February 2009)] Advances in Resist Materials and Processing Technology XXVI - Calibration of physical resist models: methods, usability, and predictive power
Klostermann, Ulrich K., Henderson, Clifford L., Mülders, Thomas, Ponomarenco, Denis, Schmöller, Thomas, Van de Kerkhove, Jeroen, De Bisschop, PeterVolume:
7273
Year:
2009
Language:
english
DOI:
10.1117/12.814216
File:
PDF, 645 KB
english, 2009