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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Optical Microlithography XXIII - Source mask optimization for advanced lithography nodes
Poonawala, Amyn, Dusa, Mircea V., Conley, Will, Stanton, William, Sawh, ChanderVolume:
7640
Year:
2010
Language:
english
DOI:
10.1117/12.846783
File:
PDF, 779 KB
english, 2010