![](/img/cover-not-exists.png)
SPIE Proceedings [SPIE SPIE Photonics Europe - Brussels, Belgium (Monday 12 April 2010)] Optical Micro- and Nanometrology III - Investigation of enhanced 2D field-stitching method as a simulation-tool for line-edge roughness in scatterometry
Bilski, Bartosz, Gorecki, Christophe, Asundi, Anand K., Frenner, Karsten, Osten, Wolfgang, Osten, WolfgangVolume:
7718
Year:
2010
Language:
english
DOI:
10.1117/12.854327
File:
PDF, 789 KB
english, 2010