SPIE Proceedings [SPIE SPIE Photomask Technology -...

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SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California (Monday 13 September 2010)] Photomask Technology 2010 - An optimized OPC and MDP flow for reducing mask write time and mask cost

Yang, Ellyn, Montgomery, M. Warren, Maurer, Wilhelm, Li, Cheng He, Park, Se Jin, Zhu, Yu, Guo, Eric
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Volume:
7823
Year:
2010
Language:
english
DOI:
10.1117/12.864790
File:
PDF, 257 KB
english, 2010
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