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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 27 February 2011)] Extreme Ultraviolet (EUV) Lithography II - Printability of buried mask defects in extreme UV lithography
Hsu, Pei-Cheng, La Fontaine, Bruno M., Naulleau, Patrick P., Yao, Ming-Jiun, Hsueh, Wen-Chang, Chen, Chia-Jen, Lee, Shin-Chang, Yu, Ching-Fang, Hsu, Luke, Chin, Sheng-Ji, Hu, Jimmy, Chang, Shu-Hao, ShVolume:
7969
Year:
2011
Language:
english
DOI:
10.1117/12.881583
File:
PDF, 710 KB
english, 2011