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SPIE Proceedings [SPIE 27th European Mask and Lithography Conference - Dresden, Germany (Tuesday 18 January 2011)] 27th European Mask and Lithography Conference - Current status of EUV mask inspection using 193nm optical inspection system in 30nm node and beyond
Han, Sang Hoon, Behringer, Uwe F.W., Na, Jihoon, Cho, Wonil, Chung, Dong Hoon, Jeon, Chan-Uk, Cho, HanKu, Bernstein, Dana, Park, Eun Young, Sreenath, Anoop, Mangan, ShmoolikVolume:
7985
Year:
2011
Language:
english
DOI:
10.1117/12.895209
File:
PDF, 1.57 MB
english, 2011