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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Alternative Lithographic Technologies IV - Detailed mesoscale dynamic simulation of block copolymer directed self-assembly processes: application of protracted colored noise dynamics
Peters, Andrew J., Lawson, Richard A., Ludovice, Peter J., Henderson, Clifford L., Tong, William M.Volume:
8323
Year:
2012
Language:
english
DOI:
10.1117/12.918077
File:
PDF, 963 KB
english, 2012