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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Metrology, Inspection, and Process Control for Microlithography XXVI - Photoresist qualification using scatterometry CD
Volkovich, Roie, Avrahamov, Yosef, Cohen, Guy, Fallon, Patricia, Yin, Wenyan, Starikov, AlexanderVolume:
8324
Year:
2012
Language:
english
DOI:
10.1117/12.918392
File:
PDF, 480 KB
english, 2012