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SPIE Proceedings [SPIE 1989 Microelectronic Intergrated Processing Conferences - Santa Clara (Tuesday 10 October 1989)] Dry Processing for Submicrometer Lithography - Etch Resistance of Silicon Containing Polymers In Oxygen Plasma Chemistry
Bobbio, S. M., Jones, Susan K., Tessier, Theodore G., Dudley, Bruce W., Cohen, Batia, Jewett, Russell F., Morosoff, Arturo, Bondur, James A., Reinberg, Alan R.Volume:
1185
Year:
1990
Language:
english
DOI:
10.1117/12.978043
File:
PDF, 6.66 MB
english, 1990