SPIE Proceedings [SPIE SPIE'S 1993 Symposium on Microlithography - San Jose, CA (Sunday 28 February 1993)] Advances in Resist Technology and Processing X - Prebake and post-exposure bake effects on the dissolution of AZ-PF
Krasnoperova, Azalia A., Reilly, Michael T., Turner, S., Ocola, L., Cerrina, Franco, Hinsberg, William D.Volume:
1925
Year:
1993
Language:
english
DOI:
10.1117/12.154767
File:
PDF, 780 KB
english, 1993