SPIE Proceedings [SPIE SPIE'S 1993 Symposium on Microlithography - San Jose, CA (Sunday 28 February 1993)] Advances in Resist Technology and Processing X - Influence of process parameters on the lithographic performance characterization in the top imaging process by silylation
Won, Tai-Kyung, Moon, Seung-Chan, Kim, Hyeong-Soo, Kim, Jin-Woong, Kim, Myung-Seon, Ahn, Dong-Jun, Choi, Soo-Han, Hinsberg, William D.Volume:
1925
Year:
1993
Language:
english
DOI:
10.1117/12.154804
File:
PDF, 763 KB
english, 1993