SPIE Proceedings [SPIE SPIE's 1994 Symposium on Microlithography - San Jose, CA (Sunday 27 February 1994)] Advances in Resist Technology and Processing XI - Deep-UV positive resist image by dry etching (DUV PRIME): a robust process for 0.3-μm contact holes
Louis, Didier, Laporte, Philippe, Molle, Pascale, Ullmann, H., Nalamasu, OmkaramVolume:
2195
Year:
1994
Language:
english
DOI:
10.1117/12.175363
File:
PDF, 609 KB
english, 1994