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SPIE Proceedings [SPIE SPIE's 1994 Symposium on Microlithography - San Jose, CA (Sunday 27 February 1994)] Advances in Resist Technology and Processing XI - Dissolution behavior of the chemically modified polyvinylphenol with introduced high-ortho structure
Honda, Kenji, Slater, Sydney G., Beauchemin, Jr., Bernard T., Toukhy, Medhat A., Tadros, Sobhy P., Aoai, Toshiaki, Kawabe, Yasumasa, Nalamasu, OmkaramVolume:
2195
Year:
1994
Language:
english
DOI:
10.1117/12.175367
File:
PDF, 524 KB
english, 1994