SPIE Proceedings [SPIE SPIE's 1994 Symposium on Microlithography - San Jose, CA (Sunday 27 February 1994)] Optical/Laser Microlithography VII - Effect of shifter edge angle and lens aberration on the pattern profile in the edge-line phase-shift method
Nakatani, Mitsunori, Matsuoka, Hiroshi, Nakano, Hirofumi, Kamon, Kazuya, Sato, Kazuhiko, Ishihara, Osamu, Mitsui, Shigeru, Brunner, Timothy A.Volume:
2197
Year:
1994
Language:
english
DOI:
10.1117/12.175410
File:
PDF, 339 KB
english, 1994