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SPIE Proceedings [SPIE Photomask and NGL Mask Technology XX - Yokohama, Japan (Tuesday 16 April 2013)] Photomask and Next-Generation Lithography Mask Technology XX - E-beam resist outgassing for study of correlation between resist sensitivity and e-beam optic contamination
Lee, Sung-Il, Jeong, Yun Song, Park, Cheol Hong, Kim, Hee Bom, Shin, Inkyun, Jeon, Chan-Uk, Kato, KokoroVolume:
8701
Year:
2013
Language:
english
DOI:
10.1117/12.2032772
File:
PDF, 933 KB
english, 2013