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SPIE Proceedings [SPIE Photomask Japan 1995 - Kanagawa, Japan (Thursday 20 April 1995)] Photomask and X-Ray Mask Technology II - Development of a W/Si thin film for the single-layered attenuated phase-shifting mask for 248-nm lithography
Mitsui, Hideaki, Sakai, Hiroyuki, Yamaguchi, Yoichi, Yoshihara, HideoVolume:
2512
Year:
1995
Language:
english
DOI:
10.1117/12.212783
File:
PDF, 239 KB
english, 1995