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SPIE Proceedings [SPIE Photomask Japan 1995 - Kanagawa, Japan (Thursday 20 April 1995)] Photomask and X-Ray Mask Technology II - Fast-resist image estimation methodology using light-intensity distribution
Tsudaka, Keisuke, Tomita, Manabu, Sugawara, Minoru, Kawahira, Hiroichi, Nozawa, Satoru, Yoshihara, HideoVolume:
2512
Year:
1995
Language:
english
DOI:
10.1117/12.212804
File:
PDF, 1.26 MB
english, 1995