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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Extreme Ultraviolet (EUV) Lithography VII - EUV and optical lithographic pattern shift at the 5nm node
Panning, Eric M., Goldberg, Kenneth A., Hosler, Erik R., Thiruvengadam, Sathish, Cantone, Jason R., Civay, Deniz E., Schroeder, PaulVolume:
9776
Year:
2016
Language:
english
DOI:
10.1117/12.2217532
File:
PDF, 1.45 MB
english, 2016