SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Extreme Ultraviolet (EUV) Lithography VII - Patterning performance of chemically amplified resist in EUV lithography
Panning, Eric M., Goldberg, Kenneth A., Fujii, Tatsuya, Matsumaru, Shogo, Yamada, Tomotaka, Komuro, Yoshitaka, Kawana, Daisuke, Ohmori, KatsumiVolume:
9776
Year:
2016
Language:
english
DOI:
10.1117/12.2218417
File:
PDF, 762 KB
english, 2016