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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Extreme Ultraviolet (EUV) Lithography VII - Approach to hp10nm resolution by applying Dry Development Rinse Process (DDRP) and Materials (DDRM)
Panning, Eric M., Goldberg, Kenneth A., Shibayama, Wataru, Shigaki, Shuhei, Takeda, Satoshi, Onishi, Ryuji, Nakajima, Makoto, Sakamoto, RikimaruVolume:
9776
Year:
2016
Language:
english
DOI:
10.1117/12.2219475
File:
PDF, 4.76 MB
english, 2016