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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Extreme Ultraviolet (EUV) Lithography VII - Scanning coherent diffractive imaging methods for actinic EUV mask metrology
Panning, Eric M., Goldberg, Kenneth A., Helfenstein, Patrick, Mohacsi, Istvan, Rajendran, Rajeev, Ekinci, YasinVolume:
9776
Year:
2016
Language:
english
DOI:
10.1117/12.2219937
File:
PDF, 649 KB
english, 2016