SPIE Proceedings [SPIE SPIE's 1996 International Symposium on Microlithography - Santa Clara, CA (Sunday 10 March 1996)] Advances in Resist Technology and Processing XIII - Calibration of chemically amplified resist models
Byers, Jeff D., Petersen, John S., Sturtevant, John L., Kunz, Roderick R.Volume:
2724
Year:
1996
Language:
english
DOI:
10.1117/12.241875
File:
PDF, 127 KB
english, 1996