![](/img/cover-not-exists.png)
SPIE Proceedings [SPIE Microlithography '97 - Santa Clara, CA (Monday 10 March 1997)] Advances in Resist Technology and Processing XIV - Novel combination of photoactive species: photoresists formed from selectively esterified novolacs and polyfunctional photoactive compounds
Jeffries III, Alfred T., Brzozowy, David J., Naiini, Ahmad A., Gallagher-Wetmore, Paula M., Tarascon-Auriol, Regine G.Volume:
3049
Year:
1997
Language:
english
DOI:
10.1117/12.275876
File:
PDF, 241 KB
english, 1997