SPIE Proceedings [SPIE ISMA '97 International Symposium on Microelectronics and Assembly - Singapore, Singapore (Monday 23 June 1997)] Microlithographic Techniques in IC Fabrication - Measurements and analysis of beam current and beam diameter of an electron-beam lithography system
Lu, Wu, Ng, Geok I., Yoon, Soon Fatt, Shen, Hao-Ying, Yoon, Soon Fatt, Yu, Raymond, Mack, Chris A.Volume:
3183
Year:
1997
Language:
english
DOI:
10.1117/12.280537
File:
PDF, 788 KB
english, 1997