SPIE Proceedings [SPIE Microelectronic Manufacturing - Santa Clara, CA (Sunday 20 September 1998)] Process, Equipment, and Materials Control in Integrated Circuit Manufacturing IV - Resolving localized oxide breakthrough during poly etch of nonvolatile floating gate structures
Healey, Jerry T., Sim, Vibol, Rubel, Scott E., Toprac, Anthony J., Dang, KimVolume:
3507
Year:
1998
Language:
english
DOI:
10.1117/12.324362
File:
PDF, 2.75 MB
english, 1998