SPIE Proceedings [SPIE Microlithography '99 - Santa Clara, CA (Sunday 14 March 1999)] Optical Microlithography XII - Characterization of CD control for sub-0.18-μm lithographic patterning
Sturtevant, John L., Allgair, John A., Fu, Chong-Cheng, Green, Kent G., Hershey, Robert R., Kling, Michael E., Litt, Lloyd C., Lucas, Kevin D., Roman, Bernard J., Seligman, Gary S., Schippers, Mike, VVolume:
3679
Year:
1999
Language:
english
DOI:
10.1117/12.354335
File:
PDF, 2.26 MB
english, 1999