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SPIE Proceedings [SPIE Photomask Technology and Management - Monterey, CA (Wednesday 15 September 1999)] 19th Annual Symposium on Photomask Technology - Practical technology path to sub-0.10-μm process generations via enhanced optical lithography
Chen, J. Fung, Laidig, Thomas L., Wampler, Kurt E., Caldwell, Roger F., Nakagawa, Kent H., Liebchen, Armin, Abboud, Frank E., Grenon, Brian J.Volume:
3873
Year:
1999
Language:
english
DOI:
10.1117/12.373297
File:
PDF, 2.32 MB
english, 1999