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SPIE Proceedings [SPIE 26th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 25 February 2001)] Optical Microlithography XIV - Optical proximity correction of critical layers in DRAM process of 0.12-μm minimum feature size
Oh, Yong-Ho, Lee, Jai-Cheol, Park, Ki-Chon, Go, Chun-Soo, Lim, Sungwoo, Progler, Christopher J.Volume:
4346
Year:
2001
Language:
english
DOI:
10.1117/12.435699
File:
PDF, 370 KB
english, 2001