SPIE Proceedings [SPIE 26th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 25 February 2001)] Optical Microlithography XIV - Novel Si-based composite thin films for 193/157-nm attenuated phase-shift mask (APSM) applications
Chey, S. J., Guarnieri, Charles R., Babich, Katherina, Pope, Keith R., Goldfarb, Dario L., Angelopoulos, Marie, Racette, Kenneth C., Hibbs, Michael S., Gibson, Margaret L., Kimmel, Kurt R., Progler, CVolume:
4346
Year:
2001
Language:
english
DOI:
10.1117/12.435779
File:
PDF, 204 KB
english, 2001
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