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SPIE Proceedings [SPIE Photomask Technology 2002 - Monterey, CA (Tuesday 1 October 2002)] 22nd Annual BACUS Symposium on Photomask Technology - Cr and TaN Absorber Mask Etch CD Performance Study For Extreme Ultraviolet Lithography
Zhang, Guojing, Yan, Pei-yang, Grenon, Brian J., Kimmel, Kurt R.Volume:
4889
Year:
2002
Language:
english
DOI:
10.1117/12.468213
File:
PDF, 298 KB
english, 2002