SPIE Proceedings [SPIE SPIE's 27th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 3 March 2002)] Emerging Lithographic Technologies VI - Thermomechanical modeling of the pin-chucked EUV reticle during exposure
Wei, Alexander C., Martin, Carl J., Beckman, William A., Mitchell, John W., Engelstad, Roxann L., Lovell, Edward G., Blaedel, Kenneth L., Engelstad, Roxann L.Volume:
4688
Year:
2002
Language:
english
DOI:
10.1117/12.472349
File:
PDF, 204 KB
english, 2002