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SPIE Proceedings [SPIE 18th European Mask Conference on Mask Technology for Integrated Circuits and Micro-Components - Munich-Unterhaching, Germany (Tuesday 15 January 2002)] 18th European Conference on Mask Technology for Integrated Circuits and Microcomponents - Recent progress of low-energy e-beam proximity projection lithography (LEEPL) with β-tool development
Shimazu, Nobuo, Nozue, Hiroshi, Endo, Akihiro, Higuchi, Akira, Ise, T., Fukui, Toyoharu, Yasumitsu, N., Miyatake, Tsutomu, Anazawa, Norimiti, Behringer, Uwe F. W.Volume:
4764
Year:
2002
Language:
english
DOI:
10.1117/12.479360
File:
PDF, 588 KB
english, 2002