SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Advances in Resist Technology and Processing XX - Simple optical system parameter optimization method by comparing the critical dimension
Ha, Mi-Ae, Sohn, Dong-Soo, Jun, Kyoung-Ah, Yoo, Ji-Yong, Oh, Hye-Keun, Kim, Jaesoon, Park, In-Ho, Fedynyshyn, Theodore H.Volume:
5039
Year:
2003
Language:
english
DOI:
10.1117/12.485070
File:
PDF, 767 KB
english, 2003