SPIE Proceedings [SPIE Asia-Pacific Optical and Wireless Communications - Wuhan, China (Sunday 2 November 2003)] Materials, Active Devices, and Optical Amplifiers - ICP etching of InP and related materials using photoresist as mask
Deng, Ligang, Andrew, Goodyear L., Dineen, Mark, Chang-Hasnain, Connie J., Huang, Dexiu, Nakano, Yoshiaki, Ren, XiaominVolume:
5280
Year:
2004
Language:
english
DOI:
10.1117/12.520922
File:
PDF, 228 KB
english, 2004