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SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Advances in Resist Technology and Processing XXI - Study of proximity lithography simulations using measurements of dissolution rate and calculation of the light intensity distributions in the photoresist
Sensu, Yoshihisa, Sturtevant, John L., Isono, Mariko, Sekiguchi, Atsushi, Kadoi, Mikio, Matsuzawa, ToshiharuVolume:
5376
Year:
2004
Language:
english
DOI:
10.1117/12.533904
File:
PDF, 393 KB
english, 2004