SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Metrology, Inspection, and Process Control for Microlithography XVIII - Capability of spectroscopic ellipsometry-based profile metrology for detecting the profile excursion of polysilicon gate
Yeh, Mike, Silver, Richard M., Fang, Shu-Ping, Tsau, Bo-Jau, Huang, Chih-Chung, Lin, Benjamin S., Fu, Steven, Chen, Jay C., Freed, Regina, Dziura, Ted G., Slessor, Mike D.Volume:
5375
Year:
2004
Language:
english
DOI:
10.1117/12.536269
File:
PDF, 290 KB
english, 2004