![](/img/cover-not-exists.png)
SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Metrology, Inspection, and Process Control for Microlithography XVIII - Qualification of a low-cost high-quality reticle process for 90-nm contact layers
Strozewski, Kirk J., Silver, Richard M., Perez, Joe, Carter, Rusty, Kiefer, Robert, Jackson, Curt, MacDonald, Susan, Kalk, FranklinVolume:
5375
Year:
2004
Language:
english
DOI:
10.1117/12.536712
File:
PDF, 166 KB
english, 2004