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SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Advances in Resist Technology and Processing XXI - Understanding the role of base quenchers in photoresists
Michaelson, Timothy B., Sturtevant, John L., Jamieson, Andrew T., Pawloski, Adam R., Byers, Jeffrey, Acheta, Alden, Willson, C. G.Volume:
5376
Year:
2004
Language:
english
DOI:
10.1117/12.537658
File:
PDF, 465 KB
english, 2004