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SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology XI - Yokohama, Japan (Wednesday 14 April 2004)] Photomask and Next-Generation Lithography Mask Technology XI - Eigen-decomposition-based models for model OPC
Shi, Xuelong, Tanabe, Hiroyoshi, Laidig, Thomas L., Chen, J. Fung, Van Den Broeke, Douglas J., Hsu, Stephen D., Hsu, Michael, Wampler, Kurt E., Hollerbach, UweVolume:
5446
Year:
2004
Language:
english
DOI:
10.1117/12.557794
File:
PDF, 187 KB
english, 2004