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SPIE Proceedings [SPIE Photomask Technology - Monterey, CA (Monday 13 September 2004)] 24th Annual BACUS Symposium on Photomask Technology - Enhanced model-based OPC for 65 nm and below
Word V, James, Cobb, Nicolas B., Staud, Wolfgang, Weed, J. TracyVolume:
5567
Year:
2004
Language:
english
DOI:
10.1117/12.568757
File:
PDF, 167 KB
english, 2004