SPIE Proceedings [SPIE Microlithography 2005 - San Jose, CA (Sunday 27 February 2005)] Metrology, Inspection, and Process Control for Microlithography XIX - Modeling of wafer alignment marks using geometrical theory of diffraction (GTD)
Tan, Chin B., Silver, Richard M., Yeo, Swee H., Khoh, AndrewVolume:
5752
Year:
2005
Language:
english
DOI:
10.1117/12.599252
File:
PDF, 693 KB
english, 2005