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SPIE Proceedings [SPIE Microlithography 2005 - San Jose, CA (Sunday 27 February 2005)] Metrology, Inspection, and Process Control for Microlithography XIX - Application of 3D scatterometry to contacts and vias at 90nm and beyond
Huang, Jacky, Silver, Richard M., Barry, Kelly, Ke, Chih-Ming, Lin, Burn, Li, AllenVolume:
5752
Year:
2005
Language:
english
DOI:
10.1117/12.601023
File:
PDF, 200 KB
english, 2005