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SPIE Proceedings [SPIE SPIE 31st International Symposium on Advanced Lithography - San Jose, CA (Sunday 19 February 2006)] Advances in Resist Technology and Processing XXIII - Optimization of dual BARC structures for hyper-NA immersion lithography
Matsuzawa, Nobuyuki N., Lin, Qinghuang, Thunnakart, Boontarika, Ozawa, Ken, Yamaguchi, Yuko, Nakano, Hiroyuki, Kawahira, HiroichiVolume:
6153
Year:
2006
Language:
english
DOI:
10.1117/12.651563
File:
PDF, 964 KB
english, 2006