SPIE Proceedings [SPIE SPIE 31st International Symposium on Advanced Lithography - San Jose, CA (Sunday 19 February 2006)] Advances in Resist Technology and Processing XXIII - Low leaching and low LWR photoresist development for 193 nm immersion lithography
Ando, Nobuo, Lin, Qinghuang, Lee, Youngjoon, Miyagawa, Takayuki, Edamatsu, Kunishige, Takemoto, Ichiki, Yamamoto, Satoshi, Tsuchida, Yoshinobu, Yamamoto, Keiko, Konishi, Shinji, Nakano, Katsushi, TomoVolume:
6153
Year:
2006
Language:
english
DOI:
10.1117/12.655586
File:
PDF, 274 KB
english, 2006