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SPIE Proceedings [SPIE SPIE 31st International Symposium on Advanced Lithography - San Jose, CA (Sunday 19 February 2006)] Metrology, Inspection, and Process Control for Microlithography XX - CD-etch depth measurement from advanced phase-shift masks and wafers using optical scatterometry
Lee, Kyung M., Archie, Chas N., Yedur, Sanjay, Henrichs, Sven, Tavassoli, MalahatVolume:
6152
Year:
2006
Language:
english
DOI:
10.1117/12.655642
File:
PDF, 299 KB
english, 2006