SPIE Proceedings [SPIE SPIE 31st International Symposium on Advanced Lithography - San Jose, CA (Sunday 19 February 2006)] Design and Process Integration for Microelectronic Manufacturing IV - Improving model-based OPC performance for sub-60nm devices using real source optical model
Jung, Sunggon, Wong, Alfred K. K., Singh, Vivek K., Kim, In-Sung, Kang, Young-Seog, Yeo, Gi-Sung, Woo, Sang-Gyun, Cho, HanKu, Moon, Joo-TaeVolume:
6156
Year:
2006
Language:
english
DOI:
10.1117/12.655954
File:
PDF, 773 KB
english, 2006