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SPIE Proceedings [SPIE SPIE 31st International Symposium on Advanced Lithography - San Jose, CA (Sunday 19 February 2006)] Optical Microlithography XIX - Efficient OPC model generation and verification for focus variation
Park, Yong-Hee, Flagello, Donis G., Ban, Yong-Chan, Hur, Duck-Hyung, Kim, Dong-Hyun, Hong, Ji-Suk, Yoo, Moon-Hyun, Kong, Jeong-TaekVolume:
6154
Year:
2006
Language:
english
DOI:
10.1117/12.656762
File:
PDF, 257 KB
english, 2006