SPIE Proceedings [SPIE SPIE 31st International Symposium on Advanced Lithography - San Jose, CA (Sunday 19 February 2006)] Optical Microlithography XIX - Influence of mask manufacturing process on printing behavior of angled line structures
Teuber, Silvio, Flagello, Donis G., Duerr, Arndt C., Herguth, Holger, Kunkel, Gerhard, Wandel, Timo, Zell, ThomasVolume:
6154
Year:
2006
Language:
english
DOI:
10.1117/12.657070
File:
PDF, 6.28 MB
english, 2006